DIGITIMES Insight: TSMC, ASML's 2031 photomask target puts High NA EUV suppliers on the clock

T2Covered by 1 source · first reported by DigiTimes (headlines) at 04 Nov, 23:38 UTC

ASML and TSMC announced plans in September 2026, ahead of the SPIE BACUS symposium, to advance high-numerical-aperture extreme ultraviolet (High NA EUV) lithography by replacing the decades-old 6-inch photomask format with larger 12-inch masks. TSMC plans to introduce High NA EUV into advanced-node…