High-NA’s Obituary Was Premature

T2Covered by 1 source · first reported by Semiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly at 01 Nov, 18:00 UTC

High numerical aperture EUV lithography was supposed to be the next step in semiconductor manufacturing. Then came the doubts: expensive scanners, smaller exposure fields, difficult economics and big customers finding ways to stretch existing equipment. It became tempting to confuse a delayed…

hardware

Sources

• T2High-NA’s Obituary Was PrematureSemiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly01 Nov, 18:00