Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)

T2Covered by 1 source · first reported by Semiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly at 25 Oct, 21:17 UTC

Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and…

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Sources

• T2Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)Semiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly25 Oct, 21:17