Maskless EUV Lithography: An Alternative to E-Beam

T2Covered by 1 source · first reported by Semiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly at 18 Oct, 15:00 UTC

Semiconductor manufacturing depends on lithography: the process of transferring tiny circuit patterns onto a silicon wafer. Conventional extreme-ultraviolet (EUV) lithography projects light with a wavelength of 13.5 nanometers through a reflective optical system, using a custom photomask to define…

hardware

Sources

• T2Maskless EUV Lithography: An Alternative to E-BeamSemiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly18 Oct, 15:00