China's 90%-localized EUV light source debuts at 15W, exposing the gap to commercial chipmaking

T2Covered by 1 source · first reported by JP/KR/TW: Korea Herald / Taipei Times / DigiTimes at 15 Oct, 23:52 UTC

Chinese semiconductor technology start-up Langdao Silex (Shanghai) Technology has publicly unveiled an extreme ultraviolet (EUV) light source prototype with a claimed 90% localization rate, marking progress in China's efforts to develop domestic lithography technology. However, the system remains…

hardware

Sources

• T2China's 90%-localized EUV light source debuts at 15W, exposing the gap to commercial chipmakingJP/KR/TW: Korea Herald / Taipei Times / DigiTimes15 Oct, 23:52