Siemens transforms computational lithography for next-generation AI semiconductors with NVIDIA cuLitho

T2Covered by 1 source · first reported by Semiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly at 15 Oct, 13:19 UTC

Collaboration between Siemens and NVIDIA delivers up to 12x acceleration for full-chip optical proximity correction (OPC) workloads in lithography Enables practical full-chip optimization of photomasks for High Numerical Aperture Extreme Ultraviolet EUV lithography (High-NA EUV) lithography using…

hardware

Sources

• T2Siemens transforms computational lithography for next-generation AI semiconductors with NVIDIA cuLithoSemiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly15 Oct, 13:19