Langdao Silex Shows an EUV Light Source Prototype, Says Mass Production Is Three to Five Years Away

T2Covered by 1 source · first reported by China: SCMP Tech / TechNode / Pandaily / KrASIA / Sixth Tone at 15 Oct, 07:45 UTC

Shanghai-based Langdao Silex displayed an LPP extreme ultraviolet light source prototype at CIIF 2026. Its low-power system delivers over 15W, far below the hundreds of watts lithography needs.

Sources

• T2Langdao Silex Shows an EUV Light Source Prototype, Says Mass Production Is Three to Five Years AwayChina: SCMP Tech / TechNode / Pandaily / KrASIA / Sixth Tone15 Oct, 07:45