ASML unveils Hyper NA EUV successor targeting 5nm single exposure

T2Covered by 1 source · first reported by JP/KR/TW: Korea Herald / Taipei Times / DigiTimes at 13 Oct, 06:26 UTC

Engineers from ASML and its optical partner Zeiss have jointly published a research paper in the October issue of the academic journal Journal of Micro/Nanopatterning, Materials and Metrology, formally disclosing "Hyper NA EUV"—the next-generation successor to current high-numerical-aperture…