Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)

T2Covered by 1 source · first reported by Semiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly at 07 Oct, 19:47 UTC

Researchers at Carl Zeiss SMT and ASML published a technical paper titled “Hyper-NA: a system with a numerical aperture of at least 0.75.” Abstract Summary: The researchers examine Hyper-NA EUV lithography with a numerical aperture of at least 0.75 as a path beyond current 0.55-NA High-NA systems…

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Sources

• T2Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)Semiconductor Engineering / SemiWiki / EE Times / EE Journal / Electronics Weekly07 Oct, 19:47