Elon Musk, Jensen Huang see China closing lithography gap by 2030

T2Covered by 1 source · first reported by JP/KR/TW: Korea Herald / Taipei Times / DigiTimes at 03 Oct, 00:31 UTC

While ASML executives explore how to scale extreme ultraviolet (EUV) lithography output beyond 110 units by 2028, China is pursuing indigenous advanced lithography systems. ASML plans to produce at least 80 EUV tools in 2027 and is investigating a further capacity increase of approximately 30% in…